nuig
Mechanical
- Aug 12, 2002
- 10
Helllo,
I'm interested in regenerating 20% caustic solution for a H2S scrubbing process, < 1 atm, 25'C gas conditions.
The gas contains 60% CH4, 38% CO2 and ~2% H2S, liquid dispersion is via spraying nozzles to minimize CO2 absorption by minimizing contact time.
During the regenerative process, sodium thiosulfate comes out in the equations.
My question is, should I be particularily concerned about this compound with regards pumping it back via recirc system?
Thanking you in advance...