Nicksun
Civil/Environmental
- May 28, 2003
- 29
Dear All,
I got a UPW plant:MMF->ACF->cat-anion->RO->MB->Polishing.
Now the MB resin can not separate well, becuase the inlet water is 1Mohm.cm and the setpoint of MB exhaust is according to 50pppt boron. so the H and OH resin still alive and absorb each other.
After discuss, we use NaOH to make a de-clamping precedure.
and after that, we did a double-regeneration.
After 10 hours rinsing, the resisitivity is fluctuating between 17.5Mohm to 13Mohm, and boron is fluctuating also from 100ppt to 0ppt. I am think the mixing was not done well. So I made another mixing. But still not satisfactory. The resistivity is still fluctuating between 17.5Mohm.cm to 16Mohm.cm.
Please help to figure out the causes.
Thanks very much.
Have a nice weekend!
Nixon
Pl
I got a UPW plant:MMF->ACF->cat-anion->RO->MB->Polishing.
Now the MB resin can not separate well, becuase the inlet water is 1Mohm.cm and the setpoint of MB exhaust is according to 50pppt boron. so the H and OH resin still alive and absorb each other.
After discuss, we use NaOH to make a de-clamping precedure.
and after that, we did a double-regeneration.
After 10 hours rinsing, the resisitivity is fluctuating between 17.5Mohm to 13Mohm, and boron is fluctuating also from 100ppt to 0ppt. I am think the mixing was not done well. So I made another mixing. But still not satisfactory. The resistivity is still fluctuating between 17.5Mohm.cm to 16Mohm.cm.
Please help to figure out the causes.
Thanks very much.
Have a nice weekend!
Nixon
Pl