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  1. diffeng

    Thickness Uniformity In Dry High Temperature Oxidation Process??

    I'm trying to increase my thickness uniformity in SiO2 deposition for a dry, high temperature oxidation process. My wafer profile is thin in the middle and thicker towards the outsides. The film is thin (~100-50 Angstroms) and the proces temperature is relatively low (~780). It appears to be...

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