Hi, Thank you very much to Kenvlach and Pual for your respond. Sorry for my late reply.
I worked on 37wt% HCl both no dilution and 50% dilution (during Feb till now). So far, this is a better ones. I have also tried on concentrated nitric acid (67-70 wt.%), the layer Cr,Co, Ni are being...
Hi,
I'm searching for the correct type of etchant for thin film media. I need to etch away the Chromium and Cobalt layers which underneatch layer is Nikel/Phosphorus and the base material is Al. I also briefly know that Hydrochloric acid and Nitric acid may work; but I need to retain the Silicon...